Self-pixelation through fracture in VO2 thin films
Rodríguez Domínguez, Laura (Institut Català de Nanociència i Nanotecnologia)
Del Corro, Elena (Institut Català de Nanociència i Nanotecnologia)
Conroy, Michele (University of Limerick. Department of Physics)
Moore, Kalani (University of Limerick. Department of Physics)
Sandiumenge Ortiz, Felip (Institut de Ciència de Materials de Barcelona)
Domingo Marimon, Neus (Institut de Ciència de Materials de Barcelona)
Santiso, José (Institut Català de Nanociència i Nanotecnologia)
Catalan, Gustau (Institut Català de Nanociència i Nanotecnologia)

Data:	2020
Resum:	Vanadium dioxide (VO2) is an archetypal Mott material with a metal-insulator transition (MIT) at near room temperature. In thin films, this transition is affected by substrate-induced strain but as film thickness increases, the strain is gradually relaxed and the bulk properties are recovered. Epitaxial films of VO2 on (001)-oriented rutile titanium dioxide (TiO2) relax substrate strain by forming a network of fracture lines that crisscross the film along well-defined crystallographic directions. This work shows that the electronic properties associated with these lines result in a pattern that resembles a "street map" of fully strained metallic VO2 blocks separated by insulating VO2 stripes. Each block of VO2 is thus electronically self-insulated from its neighbors, and its MIT can be locally induced optically with a laser, or electronically via the tip of a scanning probe microscope so that the films behave functionally as self-patterned pixel arrays.
Ajuts:	Ministerio de Economía y Competitividad MAT2016-77100-C2-1-P Ministerio de Economía y Competitividad SEV-2017-0706 Ministerio de Economía y Competitividad JC-2015-25201 Ministerio de Ciencia e Innovación FIS2017-85787
Nota:	Altres ajuts: the Catalan AGAUR agency for 2017SGR. The CERCA programme/Generalitat de Catalunya
Drets:	Tots els drets reservats.
Llengua:	Anglès
Document:	Article ; recerca ; Versió acceptada per publicar
Matèria:	Metal−insulator transition ; Thin films ; Vanadium dioxide ; Cracks ; Pixelation ; Scanning Kelvin probe microscopy
Publicat a:	ACS applied electronic materials, Vol. 2, issue 5 (May 2020) , p. 1433-1439, ISSN 2637-6113

DOI: 10.1021/acsaelm.0c00199

Preprint 28 p, 1.8 MB

El registre apareix a les col·leccions:
Documents de recerca > Documents dels grups de recerca de la UAB > Centres i grups de recerca (producció científica) > Ciències > Institut Català de Nanociència i Nanotecnologia (ICN2)
Articles > Articles de recerca
Articles > Articles publicats