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Pàgina inicial > Articles > Articles publicats > Directed Self-Assembly of Block Copolymers for the Fabrication of Functional Devices |
Data: | 2020 |
Resum: | Directed self-assembly of block copolymers is a bottom-up approach to nanofabrication that has attracted high interest in recent years due to its inherent simplicity, high throughput, low cost and potential for sub-10 nm resolution. In this paper, we review the main principles of directed self-assembly of block copolymers and give a brief overview of some of the most extended applications. We present a novel fabrication route based on the introduction of directed self-assembly of block copolymers as a patterning option for the fabrication of nanoelectromechanical systems. As a proof of concept, we demonstrate the fabrication of suspended silicon membranes clamped by dense arrays of single-crystal silicon nanowires of sub-10 nm diameter. Resulting devices can be further developed for building up high-sensitive mass sensors based on nanomechanical resonators. |
Ajuts: | Ministerio de Economía y Competitividad TEC2015-69864-R Agencia Estatal de Investigación RTI2018-102007-B-I00 European Commission 665919 European Commission 654384 Ministerio de Economía y Competitividad BES-2016-076407 |
Drets: | Aquest document està subjecte a una llicència d'ús Creative Commons. Es permet la reproducció total o parcial, la distribució, la comunicació pública de l'obra i la creació d'obres derivades, fins i tot amb finalitats comercials, sempre i quan es reconegui l'autoria de l'obra original. |
Llengua: | Anglès |
Document: | Article ; recerca ; Versió publicada |
Matèria: | Block copolymers ; Directed self-assembly ; Graphoepitaxy ; Nanolithography ; Nanomechanical devices ; Nanowires |
Publicat a: | Polymers, Vol. 12, Issue 10 (October 2020) , art. 2432, ISSN 2073-4360 |
20 p, 3.1 MB |